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High-Speed Spectroscopic Ellipsometer

High-speed Spectroscopic Ellipsometer

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ULVAC UNECS-Portable High-Speed Portable Spectroscopic Ellipsometer

The ULVAC UNECS-Portable is a portable Spectroscopic Ellipsometer developed for the rapid and highly accurate measurement of thin film thickness and optical constants, including the refractive index (n) and extinction coefficient (k).

Thanks to its 2.2 kg measurement unit, the UNECS-Portable can be easily used outside the laboratory. It is an ideal solution for Site Acceptance Tests (SAT) of vacuum systems, large-area sample measurements, and research & development applications. The fixed sample stage can be removed when required, allowing direct measurements on large-sized samples.

The UNECS-Portable utilizes ULVAC's proprietary Snapshot (Single-Shot Measurement) technology, enabling high-speed measurements with a sampling time of only 20 ms. Its compact sensor design, which contains no rotating optical mechanism, eliminates mechanical wear and minimizes periodic maintenance requirements.

Providing high-accuracy measurements of the film thickness, refractive index (n), and extinction coefficient (k) of transparent and semi-transparent thin films, the UNECS-Portable delivers reliable performance for semiconductor manufacturing, optical coatings, universities, R&D laboratories, and on-site verification of vacuum equipment.

Key Features

  • Portable design
  • Measurement unit weighs only 2.2 kg
  • Snapshot (Single-Shot Measurement) technology
  • High-speed measurement with 20 ms sampling time
  • Measurement of film thickness (D), refractive index (n), and extinction coefficient (k)
  • Suitable for transparent and semi-transparent thin films
  • Removable fixed sample stage
  • Direct measurement capability for large-sized samples
  • Maintenance-free optical system without rotating mechanisms
  • Compact sensor design
  • Windows-based analysis software
  • Ideal for both laboratory and field applications

Applications

  • Site Acceptance Testing (SAT) of vacuum systems
  • Measurement of large-sized samples
  • Semiconductor manufacturing
  • MEMS manufacturing
  • OLED manufacturing
  • LCD manufacturing
  • Photovoltaics (Solar Cells)
  • SiO₂ thin-film measurements
  • SiN thin-film measurements
  • ITO coating measurements
  • Photoresist thickness measurements
  • Universities
  • Research and Development (R&D) laboratories
  • Quality control laboratories
  • Vacuum equipment manufacturers 



Teknik Özellikler

UNECS PORTABLE
Ölçüm Prensibi Spektroskopik Elipsometri
Ölçülen Parametreler Film kalınlığı (D), Kırılma indisi (N) Sönüm katsayısı (K)
Ölçülebilen Film Şeffaf ve yarı saydam ince filmler
Dalga Boyu 530–750 nm veya 380–760 nm
Işık Kaynağı Halojen veya Xenon
Işık Açısı 70°
Ölçüm Noktası Çapı φ1 mm veya φ0,3 mm
Tekrarlanabilirlik 0,1 nm
Ölçüm Aralığı 1 nm – 2 μm
Ölçüm Süresi Örnekleme: 20–3000 ms (ayarlanabilir) Analiz: 300 ms
Maksimum Numune Kalınlığı 8 mm
Wafer Boyutu Sabit Tabla (φ150 mm, sökülebilir)
UNECS PORTABLE
Ölçüm Prensibi
Spektroskopik Elipsometri
Ölçülen Parametreler
Film kalınlığı (D), Kırılma indisi (N) Sönüm katsayısı (K)
Ölçülebilen Film
Şeffaf ve yarı saydam ince filmler
Dalga Boyu
530–750 nm veya 380–760 nm
Işık Kaynağı
Halojen veya Xenon
Işık Açısı
70°
Ölçüm Noktası Çapı
φ1 mm veya φ0,3 mm
Tekrarlanabilirlik
0,1 nm
Ölçüm Aralığı
1 nm – 2 μm
Ölçüm Süresi
Örnekleme: 20–3000 ms (ayarlanabilir) Analiz: 300 ms
Maksimum Numune Kalınlığı
8 mm
Wafer Boyutu
Sabit Tabla (φ150 mm, sökülebilir)