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ULVAC HR Series Multi-Stage Roots-Type Dry Vacuum Pump

The ULVAC HR Series is a multi-stage Roots-type dry vacuum pump developed for high-temperature processes such as CVD and etching. Thanks to the uniform high-temperature distribution throughout the pump body, it prevents the condensation of sublimable gases and particles generated during the process, allowing them to be safely evacuated in the gas phase. With its high corrosion resistance, superior helium leak tightness, and advanced communication features, it provides a reliable vacuum solution for semiconductor and advanced technology manufacturing processes.

Key Features

• Design that prevents the condensation of sublimable process gases through uniform high-temperature distribution
• High helium leak tightness and reliable operation with canned motor technology
• Protection against short-term power interruptions of up to 1000 ms
• High corrosion resistance through special surface treatments
• Advanced communication function for monitoring warnings, alarms, and operating data
• Clean and reliable vacuum environment thanks to its oil-free operating principle
• Durable and long-lasting structure designed for continuous operation

Application Areas

HR Series dry vacuum pumps are developed for applications involving high-temperature operation and corrosive process gases:

• CVD (Chemical Vapor Deposition) systems
• Etching systems
• Ashing processes
• ALD (Atomic Layer Deposition) systems
• Semiconductor manufacturing processes
• Microelectronics production lines
• Advanced coating systems
• Industrial vacuum applications using corrosive gases

Technical Advantages

The HR Series offers pumping capacities ranging from 62 m³/h to 1,051 m³/h with the HR60, HR90, HR300, HR600, and HR1200 models. Thanks to its uniformly heated pump body, it prevents the accumulation of sublimable compounds inside the pump during the process, while its advanced corrosion resistance and communication features reduce maintenance intervals and improve system reliability. It provides long-term, stable operating performance, especially in semiconductor manufacturing, CVD, and etching processes.