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ULVAC LR Series Multi-Stage Roots-Type Dry Vacuum Pump

The ULVAC LR Series is a multi-stage Roots-type dry vacuum pump developed for applications requiring high pumping performance and short evacuation times. Thanks to its low-temperature optimized pump design, it delivers outstanding performance, particularly in the rapid evacuation of PVD processes and load lock chambers. With its high helium leak tightness, advanced communication features, and reliable operation, it provides an efficient vacuum solution for semiconductor, thin-film coating, and advanced technology manufacturing processes.

Key Features

• High pumping performance with a low-temperature optimized design
• High pumping capacity that reduces evacuation time for load lock chambers
• High helium leak tightness through canned motor technology
• Protection against short-term power interruptions
• High corrosion resistance through special surface treatments
• Advanced communication function for monitoring warnings, alarms, and operating data
• Clean and reliable vacuum environment thanks to its oil-free operating principle
• Durable and long-lasting structure designed for continuous operation

Application Areas

LR Series dry vacuum pumps are preferred in a wide range of applications where fast pumping speed and high process efficiency are essential:

• PVD (Physical Vapor Deposition) systems
• Sputtering systems
• Evaporation systems
• Load lock chambers
• Backing pump applications for turbomolecular pumps
• Backing pump applications for mechanical booster pumps
• Semiconductor manufacturing systems
• Thin-film coating systems
• General industrial vacuum applications

Technical Advantages

The LR Series offers a wide pumping capacity range with the LR60, LR90, LR180, LR300, LR600, LR1200, LR1800, and LR3601 models. Thanks to its low-temperature optimized design, it significantly reduces evacuation time, especially in load lock chambers, thereby increasing production efficiency. With its high helium leak tightness, advanced control functions, and robust mechanical structure, it delivers long-lasting, reliable, and stable performance in semiconductor, PVD, and thin-film coating processes.